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Plasma Chemistry And Plasma ProcessingSCIE

国际简称：PLASMA CHEM PLASMA P 参考译名：等离子化学和等离子处理

中科院分区
3区
CiteScore分区
Q1
JCR分区
Q2

基本信息：: ISSN：0272-4324; E-ISSN：1572-8986; 是否OA：未开放; 是否预警：否; TOP期刊：否

出版信息：: 出版地区：UNITED STATES; 出版商：Springer US; 出版语言：English; 出版周期：Quarterly; 出版年份：1981; 研究方向：工程技术-工程：化工

评价信息：: 影响因子：2.6; H-index：57; CiteScore指数：5.9; SJR指数：0.48; SNIP指数：0.912

发文数据：: Gold OA文章占比：14.18%; 研究类文章占比：95.12%; 年发文量：123; 自引率：0.0833...; 开源占比：0.0935; 出版撤稿占比：0; 出版国人文章占比：0.18; OA被引用占比：0.0820...

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英文简介期刊介绍 CiteScore数据中科院SCI分区 JCR分区发文数据常见问题

英文简介Plasma Chemistry And Plasma Processing期刊介绍

Publishing original papers on fundamental and applied research in plasma chemistry and plasma processing, the scope of this journal includes processing plasmas ranging from non-thermal plasmas to thermal plasmas, and fundamental plasma studies as well as studies of specific plasma applications. Such applications include but are not limited to plasma catalysis, environmental processing including treatment of liquids and gases, biological applications of plasmas including plasma medicine and agriculture, surface modification and deposition, powder and nanostructure synthesis, energy applications including plasma combustion and reforming, resource recovery, coupling of plasmas and electrochemistry, and plasma etching. Studies of chemical kinetics in plasmas, and the interactions of plasmas with surfaces are also solicited. It is essential that submissions include substantial consideration of the role of the plasma, for example, the relevant plasma chemistry, plasma physics or plasma–surface interactions; manuscripts that consider solely the properties of materials or substances processed using a plasma are not within the journal’s scope.

期刊简介Plasma Chemistry And Plasma Processing期刊介绍

《Plasma Chemistry And Plasma Processing》自1981出版以来，是一本物理与天体物理优秀杂志。致力于发表原创科学研究结果，并为物理与天体物理各个领域的原创研究提供一个展示平台，以促进物理与天体物理领域的的进步。该刊鼓励先进的、清晰的阐述，从广泛的视角提供当前感兴趣的研究主题的新见解，或审查多年来某个重要领域的所有重要发展。该期刊特色在于及时报道物理与天体物理领域的最新进展和新发现新突破等。该刊近一年未被列入预警期刊名单，目前已被权威数据库SCIE收录，得到了广泛的认可。

该期刊投稿重要关注点：

预计审稿时间：较慢,6-12周
物理与天体物理
ENGINEERING, CHEMICAL
SCIE
中科院3区
非预警

Cite Score数据（2024年最新版）Plasma Chemistry And Plasma Processing Cite Score数据

CiteScore：5.9
SJR：0.48
SNIP：0.912

学科类别	分区	排名	百分位
大类：Physics and Astronomy 小类：Condensed Matter Physics	Q1	108 / 434	75%
大类：Physics and Astronomy 小类：Surfaces, Coatings and Films	Q2	34 / 132	74%
大类：Physics and Astronomy 小类：General Chemical Engineering	Q2	79 / 273	71%
大类：Physics and Astronomy 小类：General Chemistry	Q2	119 / 408	70%

CiteScore 是由Elsevier(爱思唯尔)推出的另一种评价期刊影响力的文献计量指标。反映出一家期刊近期发表论文的年篇均引用次数。CiteScore以Scopus数据库中收集的引文为基础，针对的是前四年发表的论文的引文。CiteScore的意义在于，它可以为学术界提供一种新的、更全面、更客观地评价期刊影响力的方法，而不仅仅是通过影响因子(IF)这一单一指标来评价。

历年Cite Score趋势图

中科院SCI分区Plasma Chemistry And Plasma Processing 中科院分区

中科院 2023年12月升级版 综述期刊：否 Top期刊：否

大类学科	分区	小类学科	分区
物理与天体物理	3区	ENGINEERING, CHEMICAL 工程：化工 PHYSICS, APPLIED 物理：应用 PHYSICS, FLUIDS & PLASMAS 物理：流体与等离子体	3区 3区 3区

中科院分区表 是以客观数据为基础，运用科学计量学方法对国际、国内学术期刊依据影响力进行等级划分的期刊评价标准。它为我国科研、教育机构的管理人员、科研工作者提供了一份评价国际学术期刊影响力的参考数据，得到了全国各地高校、科研机构的广泛认可。

中科院分区表 将所有期刊按照一定指标划分为1区、2区、3区、4区四个层次，类似于“优、良、及格”等。最开始，这个分区只是为了方便图书管理及图书情报领域的研究和期刊评估。之后中科院分区逐步发展成为了一种评价学术期刊质量的重要工具。

历年中科院分区趋势图

JCR分区Plasma Chemistry And Plasma Processing JCR分区

2023-2024 年最新版

按JIF指标学科分区	收录子集	分区	排名	百分位
学科：ENGINEERING, CHEMICAL	SCIE	Q3	91 / 170	46.8%
学科：PHYSICS, APPLIED	SCIE	Q2	81 / 179	55%
学科：PHYSICS, FLUIDS & PLASMAS	SCIE	Q2	12 / 40	71.3%

按JCI指标学科分区	收录子集	分区	排名	百分位
学科：ENGINEERING, CHEMICAL	SCIE	Q2	55 / 171	68.13%
学科：PHYSICS, APPLIED	SCIE	Q2	69 / 179	61.73%
学科：PHYSICS, FLUIDS & PLASMAS	SCIE	Q2	17 / 40	58.75%

JCR分区的优势在于它可以帮助读者对学术文献质量进行评估。不同学科的文章引用量可能存在较大的差异，此时单独依靠影响因子(IF)评价期刊的质量可能是存在一定问题的。因此，JCR将期刊按照学科门类和影响因子分为不同的分区，这样读者可以根据自己的研究领域和需求选择合适的期刊。

历年影响因子趋势图

发文数据

2023-2024 年国家/地区发文量统计

国家/地区数量
CHINA MAINLAND70
Russia37
USA29
France26
GERMANY (FED REP GER)21
Czech Republic15
Iran14
India12
Japan12
Poland11

本刊中国学者近年发表论文

1、Plasma-Catalytic Ammonia Decomposition for Carbon-Free Hydrogen Production Using Low Pressure-Synthesized Mo2N Catalyst
Author: Yu, Xiuxia; Hu, Ke; Zhang, Huazhou; He, Ge; Xia, Yuanhua; Deng, Mao; Shi, Yang; Yang, Chi; Mao, Xinchun; Wang, Zhijun

Journal: PLASMA CHEMISTRY AND PLASMA PROCESSING. 2023; Vol. 43, Issue 1, pp. 183-197. DOI: 10.1007/s11090-022-10282-y
2、Electron Density and Electron Temperature Control with a Magnetic Field and a Grid in Inductively Coupled Argon Plasma
Author: He, Yun-peng; Jin, Wei; Wang, Yi-bo; Lv, Shao-bo; Wang, Rui-sheng; Liu, Jun-qi; Liu, Hai-cheng

Journal: PLASMA CHEMISTRY AND PLASMA PROCESSING. 2023; Vol. 43, Issue 1, pp. 381-400. DOI: 10.1007/s11090-022-10295-7
3、Study on the Anticancer Effects of Plasma-Activated Saline Perfusion Based on a Microfluidic System
Author: Zhang, Jishen; Xu, Shengduo; Jing, Xixi; Liu, Dingxin; Zhang, Hao; Wang, Zifeng; Xu, Dehui; Zhang, Geng; Yang, Xiaojian; Wang, Xiaohua; Kong, Michael G.; Rong, Mingzhe

Journal: PLASMA CHEMISTRY AND PLASMA PROCESSING. 2023; Vol. 43, Issue 1, pp. 99-110. DOI: 10.1007/s11090-022-10297-5
4、A RF plasma source with focused magnetic field for material treatment
Author: Zhang, L. P.; Chang, L.; Yuan, X. G.; Zhang, J. H.; Zhou, H. S.; Luo, G. N.

Journal: PLASMA CHEMISTRY AND PLASMA PROCESSING. 2023; Vol. 43, Issue 1, pp. 329-345. DOI: 10.1007/s11090-022-10300-z
5、Influence Mechanism of O-2/H2O Adsorption on Cu(111) Surface on SF6 Overheating Failure Decomposition
Author: Zeng, Fuping; Kexin Zhu; Su, Dazhi; Feng, Xiaoxuan; Guo, Xinnuo; Yao, Qiang; Tang, Ju

Journal: PLASMA CHEMISTRY AND PLASMA PROCESSING. 2023; Vol. 43, Issue 1, pp. 67-80. DOI: 10.1007/s11090-022-10305-8
6、Synergistic 2,4-D Degradation by Fenton Reagent Obtained from Glow Discharge Plasma Formed H2O2 and DBD Pretreated Fe-Rich Sludge Catalyst
Author: Huang, Shaoyong; Huang, Quanjia; Gan, Jiaming; Li, Ting; Wang, Lei

Journal: PLASMA CHEMISTRY AND PLASMA PROCESSING. 2023; Vol. 43, Issue 2, pp. 491-511. DOI: 10.1007/s11090-022-10306-7
7、Hydrodeoxygenation of o-Cresol Over Mo2C Modified by O-2 Plasma
Author: Yu, Zihan; Yu, Zhiquan; Wang, Yao; Liu, Yingya; Wang, Anjie

Journal: PLASMA CHEMISTRY AND PLASMA PROCESSING. 2023; Vol. 43, Issue 2, pp. 533-545. DOI: 10.1007/s11090-022-10310-x
8、Theoretical Study on the Degradation Pathways of Unsymmetrical Dimethylhydrazine by Aqueous O-3
Author: Luo, Santu; Fu, Yuwei; Zhang, Mingyan; Liu, Yifan; Wang, Diankai; Zhang, Jiawei; Liu, Dingxin; Rong, Mingzhe

Journal: PLASMA CHEMISTRY AND PLASMA PROCESSING. 2023; Vol. 43, Issue 1, pp. 81-97. DOI: 10.1007/s11090-022-10307-6