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Vacuum

VacuumSCIE

国际简称:VACUUM  参考译名:真空

  • 中科院分区

    2区

  • CiteScore分区

    Q1

  • JCR分区

    Q2

基本信息:
ISSN:0042-207X
E-ISSN:1879-2715
是否OA:未开放
是否预警:否
TOP期刊:是
出版信息:
出版地区:ENGLAND
出版商:Elsevier Ltd
出版语言:English
出版周期:Monthly
出版年份:1951
研究方向:工程技术-材料科学:综合
评价信息:
影响因子:3.8
H-index:75
CiteScore指数:6.8
SJR指数:0.705
SNIP指数:1.178
发文数据:
Gold OA文章占比:5.79%
研究类文章占比:99.90%
年发文量:1005
自引率:0.175
开源占比:0.0265
出版撤稿占比:0
出版国人文章占比:0.43
OA被引用占比:0.0053...
英文简介 期刊介绍 CiteScore数据 中科院SCI分区 JCR分区 发文数据 常见问题

英文简介Vacuum期刊介绍

Vacuum is an international rapid publications journal with a focus on short communication. All papers are peer-reviewed, with the review process for short communication geared towards very fast turnaround times. The journal also published full research papers, thematic issues and selected papers from leading conferences.

A report in Vacuum should represent a major advance in an area that involves a controlled environment at pressures of one atmosphere or below.

The scope of the journal includes:

1. Vacuum; original developments in vacuum pumping and instrumentation, vacuum measurement, vacuum gas dynamics, gas-surface interactions, surface treatment for UHV applications and low outgassing, vacuum melting, sintering, and vacuum metrology. Technology and solutions for large-scale facilities (e.g., particle accelerators and fusion devices). New instrumentation ( e.g., detectors and electron microscopes).

2. Plasma science; advances in PVD, CVD, plasma-assisted CVD, ion sources, deposition processes and analysis.

3. Surface science; surface engineering, surface chemistry, surface analysis, crystal growth, ion-surface interactions and etching, nanometer-scale processing, surface modification.

4. Materials science; novel functional or structural materials. Metals, ceramics, and polymers. Experiments, simulations, and modelling for understanding structure-property relationships. Thin films and coatings. Nanostructures and ion implantation.

期刊简介Vacuum期刊介绍

《Vacuum》自1951出版以来,是一本材料科学优秀杂志。致力于发表原创科学研究结果,并为材料科学各个领域的原创研究提供一个展示平台,以促进材料科学领域的的进步。该刊鼓励先进的、清晰的阐述,从广泛的视角提供当前感兴趣的研究主题的新见解,或审查多年来某个重要领域的所有重要发展。该期刊特色在于及时报道材料科学领域的最新进展和新发现新突破等。该刊近一年未被列入预警期刊名单,目前已被权威数据库SCIE收录,得到了广泛的认可。

该期刊投稿重要关注点:

Cite Score数据(2024年最新版)Vacuum Cite Score数据

  • CiteScore:6.8
  • SJR:0.705
  • SNIP:1.178
学科类别 分区 排名 百分位
大类:Physics and Astronomy 小类:Instrumentation Q1 25 / 141

82%

大类:Physics and Astronomy 小类:Condensed Matter Physics Q1 79 / 434

81%

大类:Physics and Astronomy 小类:Surfaces, Coatings and Films Q1 31 / 132

76%

CiteScore 是由Elsevier(爱思唯尔)推出的另一种评价期刊影响力的文献计量指标。反映出一家期刊近期发表论文的年篇均引用次数。CiteScore以Scopus数据库中收集的引文为基础,针对的是前四年发表的论文的引文。CiteScore的意义在于,它可以为学术界提供一种新的、更全面、更客观地评价期刊影响力的方法,而不仅仅是通过影响因子(IF)这一单一指标来评价。

历年Cite Score趋势图

中科院SCI分区Vacuum 中科院分区

中科院 2023年12月升级版 综述期刊:否 Top期刊:否
大类学科 分区 小类学科 分区
材料科学 2区 PHYSICS, APPLIED 物理:应用 MATERIALS SCIENCE, MULTIDISCIPLINARY 材料科学:综合 2区 3区

中科院分区表 是以客观数据为基础,运用科学计量学方法对国际、国内学术期刊依据影响力进行等级划分的期刊评价标准。它为我国科研、教育机构的管理人员、科研工作者提供了一份评价国际学术期刊影响力的参考数据,得到了全国各地高校、科研机构的广泛认可。

中科院分区表 将所有期刊按照一定指标划分为1区、2区、3区、4区四个层次,类似于“优、良、及格”等。最开始,这个分区只是为了方便图书管理及图书情报领域的研究和期刊评估。之后中科院分区逐步发展成为了一种评价学术期刊质量的重要工具。

历年中科院分区趋势图

JCR分区Vacuum JCR分区

2023-2024 年最新版
按JIF指标学科分区 收录子集 分区 排名 百分位
学科:MATERIALS SCIENCE, MULTIDISCIPLINARY SCIE Q2 172 / 438

60.8%

学科:PHYSICS, APPLIED SCIE Q2 54 / 179

70.1%

按JCI指标学科分区 收录子集 分区 排名 百分位
学科:MATERIALS SCIENCE, MULTIDISCIPLINARY SCIE Q2 147 / 438

66.55%

学科:PHYSICS, APPLIED SCIE Q2 55 / 179

69.55%

JCR分区的优势在于它可以帮助读者对学术文献质量进行评估。不同学科的文章引用量可能存在较大的差异,此时单独依靠影响因子(IF)评价期刊的质量可能是存在一定问题的。因此,JCR将期刊按照学科门类和影响因子分为不同的分区,这样读者可以根据自己的研究领域和需求选择合适的期刊。

历年影响因子趋势图

发文数据

2023-2024 年国家/地区发文量统计
  • 国家/地区数量
  • CHINA MAINLAND1056
  • India311
  • Russia108
  • Japan71
  • Taiwan60
  • USA58
  • GERMANY (FED REP GER)57
  • South Korea55
  • Iran54
  • Poland43

本刊中国学者近年发表论文

  • 1、Effect of Ag content on friction and wear properties of TiCN/Ag films in different service environments

    Author: Zuo, Bin; Yu, Lihua; Xu, Junhua

    Journal: VACUUM. 2023; Vol. 212, Issue , pp. -. DOI: 10.1016/j.vacuum.2023.112029

  • 2、MOF seeding strategy for the fabrication of multi-metal oxide anode with enhanced cycling stabilization

    Author: Zheng, Guoxu; Deng, Yufeng; Ren, Mingyuan; Song, Mingxin

    Journal: VACUUM. 2023; Vol. 213, Issue , pp. -. DOI: 10.1016/j.vacuum.2023.112073

  • 3、Experimental study on the sorption performance of New-Fashioned silver getters compared with the traditional PdO in High-Vacuum multi-layer insulation vessels

    Author: Zhu, Ming; Yu, Yang; Huang, Qianghua; Li, Xiang; Gu, Chunlin; Zhang, Bo; Yao, Xin; Li, Zhaoting; Hao, Cungen

    Journal: VACUUM. 2023; Vol. 208, Issue , pp. -. DOI: 10.1016/j.vacuum.2022.111685

  • 4、Comparison of surface integrity of GH4169 superalloy after high-energy, low-energy, and femtosecond laser shock peening

    Author: Yu, Yanqing; Gong, Jianen; Fang, Xiuyang; Zhou, Longlong; He, Weifeng; Zhou, Liucheng; Cai, Zhenbing

    Journal: VACUUM. 2023; Vol. 208, Issue , pp. -. DOI: 10.1016/j.vacuum.2022.111740

  • 5、One-dimensional conductive Ni3(HHTP)2 @ woven fabrics with controlled engineering design towards high-efficiency EDL electrodes

    Author: Xu, Chang; Zhang, Jian; Lu, Huanjun; Li, Xiao; Lv, Jingchun; Zhang, Shaohui

    Journal: VACUUM. 2023; Vol. 208, Issue , pp. -. DOI: 10.1016/j.vacuum.2022.111731

  • 6、Exploration for oxygen diffusion during deoxidation process of terbium with 18O as isotope tracer

    Author: Wang, Wenbin; Gao, Sie; Ke, Buqi; Lu, Shaopeng; Li, Rufeng; Li, Guoling; Liang, Xingfang; Li, Xingguo

    Journal: VACUUM. 2023; Vol. 208, Issue , pp. -. DOI: 10.1016/j.vacuum.2022.111727

  • 7、Passive RFID microstrip photosensitive sensor based on TiO2/rGO/CuO composite

    Author: Tao, Bairui; Yao, Tangjian; Miao, Fengjuan; Zang, Yu

    Journal: VACUUM. 2023; Vol. 208, Issue , pp. -. DOI: 10.1016/j.vacuum.2022.111736

  • 8、Effect of interlayer on interfacial microstructure and properties of Ni80Cr20/TC4 vacuum diffusion bonded joint

    Author: Jian, Sijie; Liu, Kun; Li, Jie; Wang, Hao; Chen, Zhiwei; Bokuchava, Gizo

    Journal: VACUUM. 2023; Vol. 208, Issue , pp. -. DOI: 10.1016/j.vacuum.2022.111738

投稿常见问题

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